(AEII) engages in the development and production of components and subsystems for vacuum process systems primarily in the United States, Europe, and Asia.
Its products fall into four categories: power, flow control, thermal instrumentation, and source technology.
Its power systems include direct current, high power, and low, mid, and radio frequency power supplies; and radio frequency instrumentation.
AEIIís power systems are used by semiconductor and flat panel display manufacturers in physical and chemical vapor deposition; reactive sputtering; electroplating; plasma vacuum processes and bias; oxide, poly, and conductor etch; and carbon dioxide laser excitation.
The companyís flow control products include thermal mass flow controllers (MFCs), pressure-based MFCs, liquid MFCs, liquid vapor delivery systems, pressure control systems, and ultrasonic control systems.
Its flow control products are used in semiconductor applications, fiber optics, safe delivery system applications, chemical vapor deposition, and silica industries.
AEIIís thermal instrumentation products include thermal sensing systems, which are used in physical and chemical vapor deposition, and semiconductor applications requiring noncontact temperature measurement.
The companyís source technology products include plasma and ion beam sources, which are used in the direct deposition of thin films of diamond-like carbon, ion-assisted deposition, ion beam etching, optical coating, precleaning, and chamber clean.
Its products also control the flow of liquids into the process chambers and provide thermal control and sensing within the chamber.
AEII also offers direct current to direct current converters used to power low voltage, high-current microprocessors, application-specific integrated circuits, logic and memory chips, and servers.
AEII was co-founded by Douglas S.
The company was incorporated in 1981 and is headquartered in Fort Collins, Colorado.